Self-Driven UV/Periodate Process for Cu-EDTA Decomplexation and In Situ Copper Recovery

Stable copper-ethylenediaminetetraacetic acid (Cu-EDTA) poses significant challenges for simultaneous ligand degradation and metal recovery. A self-driven ultraviolet/periodate (UV/PI) process that enables efficient decomplexation of Cu-EDTA coupled with in situ copper recovery was developed. This process achieved 94.50% decomplexation and 68.94% copper recovery via precipitation within 90 min without pH adjustment. Mechanistic investigations revealed that the UV/PI process generates reactive iodine species (IO3•) and singlet oxygen (1O2), and Cu(I)/Cu(II)/Cu(III) redox cycling, driving stepwise decarboxylation of EDTA and Cu2+ release. Consequently, proton consumption during PI activation and IO3– formation induces a gradual pH increase to ∼7.5, triggering the precipitation of released Cu2+. This intrinsic coupling of oxidative decomplexation and pH-driven precipitation enables a self-sustained pathway for simultaneous ligand removal and Cu recovery. While the electrical energy per order (EEO) is comparable to that of UV/H2O2, the UV/PI process exhibits markedly lower energy consumption per mass of copper recovered than other UV/oxidant processes. Moreover, the UV/PI process further exhibits strong resistance to water matrix interference, effective performance in real electroplating wastewater, and broad applicability toward various heavy metal complexes. This study provides a mechanistically informed and environmentally benign strategy for the treatment of metal-EDTA-containing wastewater.

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Publication Details

Journal
Environmental Science & Technology
Published
2026-05-29
DOI
https://doi.org/10.1021/acs.est.5c17560
Primary Topic
Copper Interconnects and Reliability
Type
article
Field-Weighted Citation Impact
0.00

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article

Self-Driven UV/Periodate Process for Cu-EDTA Decomplexation and In Situ Copper Recovery

Leliang Wu, Dunyu Sun, Chengdu Qi, Dequan Zhang et al.
Environmental Science & Technology
Copper Interconnects and Reliability
article

Self-Driven UV/Periodate Process for Cu-EDTA Decomplexation and In Situ Copper Recovery

Leliang Wu, Dunyu Sun, Chengdu Qi, Dequan Zhang, Shaogui Yang, Longjiong Chen, Chenyu Yan, Huan He
article en

Abstract

Stable copper-ethylenediaminetetraacetic acid (Cu-EDTA) poses significant challenges for simultaneous ligand degradation and metal recovery. A self-driven ultraviolet/periodate (UV/PI) process that enables efficient decomplexation of Cu-EDTA coupled with in situ copper recovery was developed. This process achieved 94.50% decomplexation and 68.94% copper recovery via precipitation within 90 min without pH adjustment. Mechanistic investigations revealed that the UV/PI process generates reactive iodine species (IO3•) and singlet oxygen (1O2), and Cu(I)/Cu(II)/Cu(III) redox cycling, driving stepwise decarboxylation of EDTA and Cu2+ release. Consequently, proton consumption during PI activation and IO3– formation induces a gradual pH increase to ∼7.5, triggering the precipitation of released Cu2+. This intrinsic coupling of oxidative decomplexation and pH-driven precipitation enables a self-sustained pathway for simultaneous ligand removal and Cu recovery. While the electrical energy per order (EEO) is comparable to that of UV/H2O2, the UV/PI process exhibits markedly lower energy consumption per mass of copper recovered than other UV/oxidant processes. Moreover, the UV/PI process further exhibits strong resistance to water matrix interference, effective performance in real electroplating wastewater, and broad applicability toward various heavy metal complexes. This study provides a mechanistically informed and environmentally benign strategy for the treatment of metal-EDTA-containing wastewater.

Environmental Science & Technology
Nanjing Normal University (CN), Ministry of Ecology and Environment (CN), Ministry of Education (KR), Computer Emergency Response Team (FR), Suzhou Electrical Apparatus Science Academy (CN), Nanjing Institute of Environmental Sciences (CN), Anhui University of Technology (CN)
National Outstanding Youth Science Fund Project of National Natural Science Foundation of China, High-end Foreign Experts Recruitment Plan of China
Openalex Percentile: Top 14%
Copper Interconnects and Reliability
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