Structure evolution and properties of Ni films deposited by RF magnetron sputtering with and without H2-assistance

Nickel (Ni) films have a wide range of applications owing to their excellent mechanical and chemical properties. In this work, Ni thin films were deposited via radio frequency magnetron sputtering to study the effect of hydrogen (H2) introduction during the deposition process on the properties of the films. Ni films prepared with and without H2 assistance were compared by varying sputtering power, gas pressure, and substrate temperature. Key properties including surface morphology, elemental composition, surface roughness, hardness, elastic modulus, and corrosion resistance were systematically studied. Optimal deposition conditions were identified, and the H2-sputtered films consistently exhibited higher structural integrity and functional performance than the non-H2-sputtered films. The H2-sputtered films possessed a denser and smoother surface with high purity, which directly enhanced elastic modulus, hardness, and corrosion resistance. The results indicate that H2 can act as an active growth-modifying species that alters film growth at the atomic scale by suppressing O impurity incorporation, enhancing Ni adatom surface diffusion during the sputtering process. The paper may provide a new pathway to sputter high-purity, compact, and smooth metallic films with improved performance.