A variability-aware simulation and design workflow for wafer-scale, heterogeneously integrated lithium niobate modulators

We present a variability-aware simulation framework for heterogeneously integrated lithium niobate traveling-wave modulators. The framework incorporates fabrication-variation data obtained from the TRANSVERSE pilot line at Ghent University-imec and enables efficient optimization of geometric parameters to ensure stable device performance across wafer-scale manufacturing. The proposed multi-parameter optimization method enables the efficient identification of modulator designs that simultaneously achieve target performance metrics (Vπ, optical insertion loss, and 3 dB electro-optic bandwidth) while maintaining robustness against fabrication-induced variations. Using this methodology on two representative modulator architectures, we theoretically demonstrate that reliable wafer-scale integration of lithium niobate modulators on silicon photonics via micro-transfer printing is feasible and can be systematically engineered.

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Publication Details

Journal
APL Engineering Physics
Published
2026-11-06
DOI
https://doi.org/10.1063/5.0345989
Citations
1
Primary Topic
Photorefractive and Nonlinear Optics
Type
article
Field-Weighted Citation Impact
1.31

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A variability-aware simulation and design workflow for wafer-scale, heterogeneously integrated lithium niobate modulators

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A variability-aware simulation and design workflow for wafer-scale, heterogeneously integrated lithium niobate modulators

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article en
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Abstract

We present a variability-aware simulation framework for heterogeneously integrated lithium niobate traveling-wave modulators. The framework incorporates fabrication-variation data obtained from the TRANSVERSE pilot line at Ghent University-imec and enables efficient optimization of geometric parameters to ensure stable device performance across wafer-scale manufacturing. The proposed multi-parameter optimization method enables the efficient identification of modulator designs that simultaneously achieve target performance metrics (Vπ, optical insertion loss, and 3 dB electro-optic bandwidth) while maintaining robustness against fabrication-induced variations. Using this methodology on two representative modulator architectures, we theoretically demonstrate that reliable wafer-scale integration of lithium niobate modulators on silicon photonics via micro-transfer printing is feasible and can be systematically engineered.

APL Engineering PhysicsVol. 2(2)
Ghent University (BE), IMEC (BE)
Fonds De La Recherche Scientifique - FNRS, Fonds Wetenschappelijk Onderzoek
Industry, innovation and infrastructure
Openalex Percentile: Top 18%
Photorefractive and Nonlinear Optics
1.31
DOIOpen Access PDFOpenAlex
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