Logic Functionality and Circuit Design of In <sub>2</sub> Se <sub>3</sub> ‐Based Split‐Gate Ferroelectric Field‐Effect Transistor for Zero‐Trust Applications

ABSTRACT Van der Waals ferroelectric materials are emerging as key building blocks for future logic devices and integrated circuits. Among them, α‐In 2 Se 3 offers a unique combination of robust room temperature ferroelectricity and semiconducting behavior. Here, we present α‐In 2 Se 3 ‐based ferroelectric semiconductor field‐effect transistors (FeS‐FETs) with a split‐gate architecture that enables multifunctional logic operations. Operating in the high equivalent oxide thickness (EOT) regime, the devices exhibit a clockwise transfer hysteresis with a wide memory window and an on/off ratio above 10 4 . The split‐gate design enables independent control over channel segments, allowing implementation of volatile NAND logic and reconfigurable Fe‐NAND/Fe‐NOR operations. In addition, multilevel conductance states and programmable threshold‐voltage shifts are demonstrated, further extending the device functionality toward multi‐valued and analog computing. Circuit simulations using a FeS‐FET equivalent model show that two devices are connected in parallel, and all elementary Boolean logic functions can be achieved. Notably, the programmed states retain for ∼10 2 s, a balanced retention window ideally suited for applications in security‐focused “zero‐trust” environments where temporary data storage and self‐erasure are desired.

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Publication Details

Journal
Advanced Electronic Materials
Published
2026-05-27
DOI
https://doi.org/10.1002/aelm.202500871
Primary Topic
Ferroelectric and Negative Capacitance Devices
Type
article
Field-Weighted Citation Impact
0.00

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article

Logic Functionality and Circuit Design of In 2 Se 3 ‐Based Split‐Gate Ferroelectric Field‐Effect Transistor for Zero‐Trust Applications

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Advanced Electronic Materials
Ferroelectric and Negative Capacitance Devices
article

Logic Functionality and Circuit Design of In 2 Se 3 ‐Based Split‐Gate Ferroelectric Field‐Effect Transistor for Zero‐Trust Applications

Abdelkarim Ouerghi, Jean‐François Dayen, Aymen Mahmoudi, Ian O’Connor, Bernard Doudin, S. Masood, Ankita Ram, Alexei Gruverman, Takashi Taniguchi, Cédric Marchand, Kenji Watanabe
article en

Abstract

ABSTRACT Van der Waals ferroelectric materials are emerging as key building blocks for future logic devices and integrated circuits. Among them, α‐In 2 Se 3 offers a unique combination of robust room temperature ferroelectricity and semiconducting behavior. Here, we present α‐In 2 Se 3 ‐based ferroelectric semiconductor field‐effect transistors (FeS‐FETs) with a split‐gate architecture that enables multifunctional logic operations. Operating in the high equivalent oxide thickness (EOT) regime, the devices exhibit a clockwise transfer hysteresis with a wide memory window and an on/off ratio above 10 4 . The split‐gate design enables independent control over channel segments, allowing implementation of volatile NAND logic and reconfigurable Fe‐NAND/Fe‐NOR operations. In addition, multilevel conductance states and programmable threshold‐voltage shifts are demonstrated, further extending the device functionality toward multi‐valued and analog computing. Circuit simulations using a FeS‐FET equivalent model show that two devices are connected in parallel, and all elementary Boolean logic functions can be achieved. Notably, the programmed states retain for ∼10 2 s, a balanced retention window ideally suited for applications in security‐focused “zero‐trust” environments where temporary data storage and self‐erasure are desired.

Advanced Electronic Materials
École Centrale de Lyon (FR), University of Nebraska–Lincoln (US), Centre National de la Recherche Scientifique (FR), National Institute for Materials Science (JP), Centre de Nanosciences et de Nanotechnologies (FR), Université de Strasbourg (FR)
National Science Foundation, Agence Nationale de la Recherche, Japan Society for the Promotion of Science, HORIZON EUROPE European Innovation Council
Openalex Percentile: Top 9%
Ferroelectric and Negative Capacitance Devices
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