State of the Art on Thin Films of Metals, Metalloids and Lanthanides and Their Binary Compounds Prepared by PLD and RPLD Techniques

This article reviews the state of the art of laser ablation and deposition techniques applied so far to more than 50 elements, including metals, metalloids and lanthanides, yielding a wide variety of compounds in the form of thin films. Laser deposition processes have been performed in high-vacuum (HV) reactors at pressure values ranging between 10−1 and 10−5 Pa, namely pulsed laser deposition (PLD), or, under different reactive gas ambient (O2, N2, CH4, NH3 and many others), so-called reactive pulsed laser deposition (RPLD), with the aim to form thin films with desirable chemical compositions. While a few metals have not been deposited as pure metallic films because they have no immediate technological interest, others, like alkali and alkaline earth metals, cannot be deposited in pure metallic form due to their very strong reactivity with oxygen, water vapor and hydrogen molecules which are always present, even in ultra-high-vacuum (UHV) systems, at pressure values of 10−5–10−10 Pa. Furthermore, elements of the Mendeleev periodic table with an atomic number higher than 88, such as actinides and synthetic elements, are dangerous to handle and deposit in the form of thin films due to their high radioactivity; therefore, they are excluded from this review. The inclusion of the non-metal thin films of carbon (C) and related chemical compounds prepared by PLD and RPLD in the present review is justified by the extensive research and the numerous scientific articles reported in the field. All the results obtained by PLD and RPLD techniques so far are discussed and presented in tabular format to guide the reader.