Room temperature molding of amorphous dielectrics via van der Waals anisotropy at the nanoscale
. By removing reliance on elastic substrates, this work extends the scope of instability-driven, lithography-free subwavelength patterning to CMOS-relevant dielectrics.
Authors
- Xuedan Ma (ORCID: https://orcid.org/0000-0002-3163-1249)
- Yimo Han (ORCID: https://orcid.org/0000-0003-0563-4611)
- Kenji Watanabe (ORCID: https://orcid.org/0000-0003-3701-8119)
- Aryan Chugh (ORCID: https://orcid.org/0009-0000-5529-8711)
- Jun Lou (ORCID: https://orcid.org/0000-0002-4351-9561)
- Zhengjie Huang
- Yanfei Gao (ORCID: https://orcid.org/0000-0003-2082-857X)
- Takashi Taniguchi (ORCID: https://orcid.org/0000-0002-1467-3105)
- Hae Yeon Lee (ORCID: https://orcid.org/0009-0004-9020-0803)
- Xinyan Li (ORCID: https://orcid.org/0000-0002-3005-0151)
- Tian Lang (ORCID: https://orcid.org/0009-0004-9115-5872)
- Yifeng Liu
- Chen-yang Lin
Institutions
- National Institute for Materials Science (JP)
- Rice University (US)
- University of Tennessee at Knoxville (US)
Publication Details
- Journal
- Nature Communications
- Published
- 2026-05-12
- DOI
- https://doi.org/10.1038/s41467-026-73078-0
- Primary Topic
- Thermal properties of materials
- Type
- article
- Field-Weighted Citation Impact
- 0.00
Funders
- Army Research Office