Heterogeneous integration of micro-LEDs via multiple simultaneous transfer and bonding
Micro light-emitting diodes (Micro-LEDs) have emerged as next-generation display technologies because of their outstanding performance and stability. However, the assembly of Micro-LEDs with various colors, functions, and dimensions for full-color displays has been limited by the irreversible bonding between the Micro-LEDs and the backplanes. Here, we report a multiple simultaneous transfer and bonding (SITRAB) technology for the heterogeneous integration of Micro-LEDs. During the SITRAB process, Micro-LEDs were transferred and bonded onto display substrates within a few seconds through laser-induced soldering. Despite repeated infrared laser exposures, SITRAB adhesive, our bonding material, maintained its soldering capability. Therefore, Micro-LEDs from different interposers were sequentially integrated with the same backplane by repeating SITRAB. For instance, AlGaInP and InGaN LEDs were integrated onto a passive-matrix backplane, displaying a 165 pixels-per-inch image. 15 × 15 Micro-LED arrays were stitched to scale a display size by four times. Redundant LEDs were instantly transferred onto a defective display to achieve a 99.80% pixel yield. RGB Micro-LEDs with different chip thicknesses were assembled on a glass backplane to demonstrate a 32 × 32 resolution full-color display.
Authors
- Gwang‐Mun Choi (ORCID: https://orcid.org/0000-0002-0799-6897)
- Byung Jo Um
- Ki‐Seok Jang
- Yong‐Sung Eom (ORCID: https://orcid.org/0000-0002-5678-9093)
- Jiho Joo (ORCID: https://orcid.org/0000-0003-2478-1908)
- Jin‐Hyuk Oh
- Byeong‐Soo Bae (ORCID: https://orcid.org/0000-0001-9424-1830)
- Chanmi Lee
- Kwang-Seong Choi
- Jungho Shin (ORCID: https://orcid.org/0009-0007-0016-4530)
Institutions
- Electronics and Telecommunications Research Institute (KR)
- Korea Advanced Institute of Science and Technology (KR)
- Advanced Device Technology (United States) (US)
- Korea University of Science and Technology (KR)
Publication Details
- Journal
- Microsystems & Nanoengineering
- Published
- 2026-05-11
- DOI
- https://doi.org/10.1038/s41378-026-01304-2
- Primary Topic
- 3D IC and TSV technologies
- Type
- article
- Field-Weighted Citation Impact
- 0.00