Fundamentals of Chemical Vapor Deposition (CVD) and Atomic Layer Deposition (ALD) and Safety Management of Chemical Substances Part 2 : Fundamentals of Chemical Reaction Kinetics

In order to discuss chemical vapor deposition (CVD) and atomic layer deposition (ALD), it is necessary to understand chemical reactions. Part 3 of this course will explain actual reaction analysis and process control technologies for CVD and ALD. In this, Part 2, the basics of chemical reactions were explained for application to CVD and ALD.

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Publication Details

Journal
Vacuum and Surface Science
Published
2026-05-09
DOI
https://doi.org/10.1380/vss.69.275
Primary Topic
Semiconductor materials and devices
Type
article
Field-Weighted Citation Impact
0.00
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article

Fundamentals of Chemical Vapor Deposition (CVD) and Atomic Layer Deposition (ALD) and Safety Management of Chemical Substances Part 2 : Fundamentals of Chemical Reaction Kinetics

Atsushi SEKIGUCHI
Vacuum and Surface Science
Semiconductor materials and devices
article

Fundamentals of Chemical Vapor Deposition (CVD) and Atomic Layer Deposition (ALD) and Safety Management of Chemical Substances Part 2 : Fundamentals of Chemical Reaction Kinetics

Atsushi SEKIGUCHI
article en

Abstract

In order to discuss chemical vapor deposition (CVD) and atomic layer deposition (ALD), it is necessary to understand chemical reactions. Part 3 of this course will explain actual reaction analysis and process control technologies for CVD and ALD. In this, Part 2, the basics of chemical reactions were explained for application to CVD and ALD.

Vacuum and Surface ScienceVol. 69(5)
Kogakuin University (JP)
Openalex Percentile: Top 8%
Semiconductor materials and devices
DOIOpen Access PDFOpenAlex
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Fundamentals of Chemical Vapor Deposition (CVD) and Atomic Layer Deposition (ALD) and Safety Management of Chemical Substances Part 2 : Fundamentals of Chemical Reaction Kinetics — Atsushi SEKIGUCHI · Vacuum and Surface Science (2026) | TGRS Research Map | TGRS