Reconfigurable second-harmonic generation via plasmonic nanoslits counteracting strain-induced suppression in monolayer MoS<sub>2</sub>.

on unpatterned Au films. Applying 1.2% compressive strain increases the SHG intensity by approximately threefold relative to the unstrained state, demonstrating effective strain-enabled modulation. Upon mechanical bending, the SHG response is reversibly modulated and remains stable after an initial preconditioning regime, retaining more than 95% of its initial intensity over repeated bending cycles. This strain-adaptive platform demonstrates robust cycling stability and provides a previously unexplored strategy for dynamically reconfigurable nonlinear metasurfaces, enabling applications in wearable sensors, tunable modulators, and compact frequency converters.

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Publication Details

Journal
PubMed
Published
2026-05-08
DOI
https://doi.org/10.1126/sciadv.aed4575
Primary Topic
Plasmonic and Surface Plasmon Research
Type
article
Field-Weighted Citation Impact
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article

Reconfigurable second-harmonic generation via plasmonic nanoslits counteracting strain-induced suppression in monolayer MoS2.

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Reconfigurable second-harmonic generation via plasmonic nanoslits counteracting strain-induced suppression in monolayer MoS2.

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article en

Abstract

on unpatterned Au films. Applying 1.2% compressive strain increases the SHG intensity by approximately threefold relative to the unstrained state, demonstrating effective strain-enabled modulation. Upon mechanical bending, the SHG response is reversibly modulated and remains stable after an initial preconditioning regime, retaining more than 95% of its initial intensity over repeated bending cycles. This strain-adaptive platform demonstrates robust cycling stability and provides a previously unexplored strategy for dynamically reconfigurable nonlinear metasurfaces, enabling applications in wearable sensors, tunable modulators, and compact frequency converters.

PubMedVol. 12(19)
Ulsan National Institute of Science and Technology (KR), Ajou University (KR)
Affordable and clean energy
Openalex Percentile: Top 8%
Plasmonic and Surface Plasmon Research
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