Reconstruction of Transistor Amplification Principle and Engineering Implementation Based on Status-Relational Entropy (SRE) Dynamics

This framework proposes a novel transistor amplification design based on Status Relational Entropy (SRE) dynamics. By defining the electron as a stable causal chain topological structure with a Mobius cyclic flow, it uses macroscopic geometric boundaries and microscopic probabilistic counter balancing to lock amplification parameters. To eliminate thermal drift without post silicon active compensation networks, a graded heterojunction lattice is introduced into the base region to balance phonon induced path elongation and strain induced path shortening. Practical research pathways including multi finger EDA layout rules, SiGe process integration mapping, and critical reliability margins are systematically outlined for next generation high precision semiconductor design.

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Publication Details

Journal
Zenodo (CERN European Organization for Nuclear Research)
Published
2026-05-12
DOI
https://doi.org/10.5281/zenodo.20067272
Primary Topic
Advancements in Semiconductor Devices and Circuit Design
Type
article
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article

Reconstruction of Transistor Amplification Principle and Engineering Implementation Based on Status-Relational Entropy (SRE) Dynamics

Yue Lu
Zenodo (CERN European Organization for Nuclear Research)
Advancements in Semiconductor Devices and Circuit Design
article

Reconstruction of Transistor Amplification Principle and Engineering Implementation Based on Status-Relational Entropy (SRE) Dynamics

Yue Lu
article en

Abstract

This framework proposes a novel transistor amplification design based on Status Relational Entropy (SRE) dynamics. By defining the electron as a stable causal chain topological structure with a Mobius cyclic flow, it uses macroscopic geometric boundaries and microscopic probabilistic counter balancing to lock amplification parameters. To eliminate thermal drift without post silicon active compensation networks, a graded heterojunction lattice is introduced into the base region to balance phonon induced path elongation and strain induced path shortening. Practical research pathways including multi finger EDA layout rules, SiGe process integration mapping, and critical reliability margins are systematically outlined for next generation high precision semiconductor design.

Zenodo (CERN European Organization for Nuclear Research)
Affordable and clean energy
Openalex Percentile: Top 12%
Advancements in Semiconductor Devices and Circuit Design
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