Anodic vacuum arc evaporation of graphite for depositing layers of tetrahedral amorphous carbon
Anodic vacuum arc evaporation was applied to deposit ta-C layers with thicknesses of 1.3–2.2 μm at high deposition rates of up to 18 nm/s. Building on prior work that was limited to a thickness of 0.8 μm due to high heat flux and adhesion issues, substrates with a high heat capacity and adhesion-promoting interlayers were used. Nanoindentation tests revealed hardness values ranging from 71 to 84 GPa and Young’s moduli ranging from 717 to 862 GPa for these layers. Raman spectrometry revealed an sp3 content of 68% to 75%. The layers are free of arc-typical droplets and have a very smooth surface. These results demonstrate that anodic vacuum arc evaporation, when combined with targeted thermal management and interlayer design, provides a scalable method of producing ta-C coatings for challenging mechanical or chemical engineering applications.
Authors
- Bert Scheffel (ORCID: https://orcid.org/0000-0001-5743-6874)
- Robert Werberger (ORCID: https://orcid.org/0000-0002-9620-2867)
- Ludwig Decker
- Stefan Saager (ORCID: https://orcid.org/0000-0002-3703-3047)
- O. Zywitzki (ORCID: https://orcid.org/0009-0005-8790-3214)
- Thomas Modes
Institutions
- Fraunhofer Institute for Organic Electronics, Electron Beam and Plasma Technology (DE)
Publication Details
- Journal
- Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
- Published
- 2026-04-27
- DOI
- https://doi.org/10.1116/6.0005354
- Primary Topic
- Diamond and Carbon-based Materials Research
- Type
- article
- Field-Weighted Citation Impact
- 0.00