Transition Metal Dichalcogenide MoS <sub>2</sub> : Oxygen and Fluorine Functionalization for Selective Plasma Processing
) generalizes to other TMDs, functionalizations, and surface impact conditions. Our results highlight oxygen/fluorine functionalization, ionic impact angle, and material temperature to be key control parameters for selective, damage-controlled chalcogen removal in TMD processing.
Authors
- S. Khalid (ORCID: https://orcid.org/0000-0003-3806-3827)
- Yury Polyachenko (ORCID: https://orcid.org/0000-0002-9244-798X)
- Igor Kaganovich
- Yuri Barsukov
Institutions
- Princeton University (US)
- Princeton Plasma Physics Laboratory (US)
Publication Details
- Journal
- The Journal of Physical Chemistry Letters
- Published
- 2026-04-27
- DOI
- https://doi.org/10.1021/acs.jpclett.6c00348
- Primary Topic
- 2D Materials and Applications
- Type
- article
- Field-Weighted Citation Impact
- 0.00
Funders
- Fusion Energy Sciences