Study of the Topographic and Optical Characteristics of Cerium Oxide Thin Films Prepared by the Thermochemical Spraying Method

In this work, thin films of cerium oxide were prepared using the thermochemical spraying method. The material was deposited on different segments, including glass, crystal silicon and porous silicon. An atomic force microscope (AFM) was used to analyze surface roughness and morphological homogeneity of the thin films, where its AFM images showed clear differences in roughness and surface homogeneity between samples. Nanoscale compositions appeared more clearly in the silicon wafers compared to glass and photoluminescence analysis (PL) technology was used for the study of optical emissions and locations of oriented lengths, where this technique revealed a major emission at 863.2 nm in the case of sedimentation on porous silicon, indicating the effect of the concentration on the optical properties, as well as the use of UV-visible (UV-Vis) spectrometry technology to determine the energy facets and absorption properties, where it showed that the energy gap differs by different substrates and was its highest value when deposition was on glass (3.46 eV). According to UV-Vis measurements, these results open the way for multiple applications in optical reagents and other optical devices.

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Publication Details

Journal
Tikrit Journal of Pure Science
Published
2026-04-25
DOI
https://doi.org/10.25130/tjps.v31i2.1919
Primary Topic
Chemical and Physical Properties of Materials
Type
article
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article

Study of the Topographic and Optical Characteristics of Cerium Oxide Thin Films Prepared by the Thermochemical Spraying Method

Amjad H. Jassim, Zainab Emad khaled
Tikrit Journal of Pure Science
Chemical and Physical Properties of Materials
article

Study of the Topographic and Optical Characteristics of Cerium Oxide Thin Films Prepared by the Thermochemical Spraying Method

Amjad H. Jassim, Zainab Emad khaled
article en

Abstract

In this work, thin films of cerium oxide were prepared using the thermochemical spraying method. The material was deposited on different segments, including glass, crystal silicon and porous silicon. An atomic force microscope (AFM) was used to analyze surface roughness and morphological homogeneity of the thin films, where its AFM images showed clear differences in roughness and surface homogeneity between samples. Nanoscale compositions appeared more clearly in the silicon wafers compared to glass and photoluminescence analysis (PL) technology was used for the study of optical emissions and locations of oriented lengths, where this technique revealed a major emission at 863.2 nm in the case of sedimentation on porous silicon, indicating the effect of the concentration on the optical properties, as well as the use of UV-visible (UV-Vis) spectrometry technology to determine the energy facets and absorption properties, where it showed that the energy gap differs by different substrates and was its highest value when deposition was on glass (3.46 eV). According to UV-Vis measurements, these results open the way for multiple applications in optical reagents and other optical devices.

Tikrit Journal of Pure ScienceVol. 31(2)
University of Tikrit (IQ)
Openalex Percentile: Top 17%
Chemical and Physical Properties of Materials
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