Puckering vs. Localisation: Contrasting Nanoscale Lithography and Wear Mechanisms in MoS2 and Graphene on SiO2

Two-dimensional (2D) materials are promising candidates for nanoscale wear-protective coatings. The mechanisms governing their tribological behaviour (i.e., friction and wear) are material-dependent. In this work, we use atomistic molecular dynamics simulations to investigate nanoscale sliding, friction, and lithographic tracks in two 2D materials, graphene and MoS2, both placed on a SiO2 substrate. Our results reveal fundamentally different deformation mechanisms in the two materials, where deformation comes as a consequence of applied normal load. MoS2 deforms via the formation of a stable out-of-plane pucker beneath the contact, enabling efficient absorption and elastic redistribution of mechanical energy within the coating as well as simultaneous reduction of plastic deformation of the underlying material. Wear prevention in the substrate comes at the cost of localised damage to the MoS2 layer along the sliding path once it reaches the rupture point. On the contrary, graphene exhibits strongly localised deformation due to its high in-plane stiffness and atomic thickness, leading to plastic deformation of the underlying material and mitigating layer damage. These findings provide clear design guidelines for 2D coatings in nanotribological applications, and highlight layered materials, such as MoS2, as particularly effective for wear protection.