Advanced Characterization of 2D Materials Using SLEEM/ToF

Two-dimensional (2D) materials exhibit electronic and collective excitation properties that are highly sensitive to surface chemistry and thickness, requiring surface-sensitive characterization at low electron energies. Here, we investigate graphene, hexagonal boron nitride (h-BN), molybdenum disulfide (MoS2), and titanium carbide (Ti3C2) MXene using an advanced home-built scanning low-energy electron microscopy system combined with time-of-flight electron spectroscopy (SLEEM/ToF). The system uniquely records electron energy-loss spectra (EELS) from transmitted electrons rather than from the reflected electrons used in conventional SLEEM. Compared with high-energy EELS, our low-energy ToF-EELS approach offers enhanced surface sensitivity and reduced beam-induced damage, enabling direct probing of π and π + σ plasmon excitations. Additionally, complementary techniques, including scanning transmission electron microscopy (STEM), Raman spectroscopy, and X-ray photoelectron spectroscopy (XPS), were employed to characterize structural and chemical properties. EELS were acquired for all investigated 2D materials at electron landing energies of 500–1500 eV, and in the 5–50 eV range for selected materials, including graphene and MoS2. Analysis of these spectra enabled determination of the average plasmon positions across the measured energy range for all studied materials. Furthermore, a quantitative determination of the inelastic mean free path (IMFP) was achieved for graphene in the 10–50 eV range, yielding a value of 1.9 ± 0.2 nm. These results demonstrate the potential of SLEEM–ToF for surface-sensitive analysis of 2D materials.