Nanosecond dual-wavelength irradiation effects on laser-induced damage in hafnia coatings

Nanosecond dual-wavelength laser-induced damage was investigated at 1064 nm (1 ω ) and 355 nm (3 ω ) on ion-beam-sputtered hafnia single-layer coatings. Single-wavelength 1-on-1 tests were first conducted to establish reference onset fluences. Dual-wavelength tests combined a primary beam with variable fluence at one wavelength and a background, secondary wavelength beam with fixed fluences set to several percentages of the corresponding onset fluence. When 1 ω was used as the background irradiation, the perceived damage resistance at 3 ω decreased gradually. In contrast, 3 ω background irradiation at as little as 10% of the onset fluence led to an abrupt ≈50% reduction in the perceived 1 ω damage resistance, followed by modest changes upon further increases in 3 ω background fluences. Scanning electron microscopy and conversion ratios indicate that 3 ω light is the primary driver of damage onset in the case of dual wavelength irradiation. A two-step precursor generation and activation model reproduces the 3 ω behavior (1 ω as background), but not the strong initial 1 ω reduction (3 ω as background), suggesting additional 3 ω -induced precursors that saturate at low fluence.

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Publication Details

Journal
Applied Optics
Published
2026-04-22
DOI
https://doi.org/10.1364/ao.592272
Primary Topic
Laser Material Processing Techniques
Type
article
Field-Weighted Citation Impact
0.00

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article

Nanosecond dual-wavelength irradiation effects on laser-induced damage in hafnia coatings

Saaxewer Diop, Amira Guediche, Charles Bouyer, Guilhem Rouzaud et al.
Applied Optics
Laser Material Processing Techniques
article

Nanosecond dual-wavelength irradiation effects on laser-induced damage in hafnia coatings

Saaxewer Diop, Amira Guediche, Charles Bouyer, Guilhem Rouzaud, Raluca A. Negres, Jungmin Ha, Laurent Lamaignère, Colin Harthcock
article en

Abstract

Nanosecond dual-wavelength laser-induced damage was investigated at 1064 nm (1 ω ) and 355 nm (3 ω ) on ion-beam-sputtered hafnia single-layer coatings. Single-wavelength 1-on-1 tests were first conducted to establish reference onset fluences. Dual-wavelength tests combined a primary beam with variable fluence at one wavelength and a background, secondary wavelength beam with fixed fluences set to several percentages of the corresponding onset fluence. When 1 ω was used as the background irradiation, the perceived damage resistance at 3 ω decreased gradually. In contrast, 3 ω background irradiation at as little as 10% of the onset fluence led to an abrupt ≈50% reduction in the perceived 1 ω damage resistance, followed by modest changes upon further increases in 3 ω background fluences. Scanning electron microscopy and conversion ratios indicate that 3 ω light is the primary driver of damage onset in the case of dual wavelength irradiation. A two-step precursor generation and activation model reproduces the 3 ω behavior (1 ω as background), but not the strong initial 1 ω reduction (3 ω as background), suggesting additional 3 ω -induced precursors that saturate at low fluence.

Applied OpticsVol. 65(14)
CEA CESTA (FR)
Lawrence Livermore National Laboratory
Openalex Percentile: Top 17%
Laser Material Processing Techniques
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