Mo-4d Orbital Selectivity Induced by Disorder and Substrate–Film Interaction in Monolayer MoS2

Based on DFT+DMFT calculations, we explore the interplay between electron correlations, lattice disorder and substrate–film interaction on the Mo-4d spectra MoS2 monolayer. We show that MoS2 serves as an ideal testing ground for the exploration of weakly correlated phenomena with tunable semiconducting-to-metal phase transitions. We also show why our orbital-selective results in the dirty limit are important to understanding the emergence of substrate-induced localized in-gap states and the implication of it for future memristors for memory-based neuromorphic computing.

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Publication Details

Journal
Semiconductors and Heterogeneous Integration
Published
2026-04-21
DOI
https://doi.org/10.3390/shi1010003
Primary Topic
2D Materials and Applications
Type
article
Field-Weighted Citation Impact
0.00

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article

Mo-4d Orbital Selectivity Induced by Disorder and Substrate–Film Interaction in Monolayer MoS2

Luis Craco
Semiconductors and Heterogeneous Integration
2D Materials and Applications
article

Mo-4d Orbital Selectivity Induced by Disorder and Substrate–Film Interaction in Monolayer MoS2

Luis Craco
article en

Abstract

Based on DFT+DMFT calculations, we explore the interplay between electron correlations, lattice disorder and substrate–film interaction on the Mo-4d spectra MoS2 monolayer. We show that MoS2 serves as an ideal testing ground for the exploration of weakly correlated phenomena with tunable semiconducting-to-metal phase transitions. We also show why our orbital-selective results in the dirty limit are important to understanding the emergence of substrate-induced localized in-gap states and the implication of it for future memristors for memory-based neuromorphic computing.

Semiconductors and Heterogeneous IntegrationVol. 1(1)
Leibniz Institute for Solid State and Materials Research (DE), Universidade Federal de Mato Grosso (BR)
Conselho Nacional de Desenvolvimento Científico e Tecnológico, Financiadora de Estudos e Projetos
Openalex Percentile: Top 11%
2D Materials and Applications
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