Laser Ultra-Nanoablation of Diamond Free from Color Center Generation

The process of nanoablation of the diamond surface by nanosecond UV radiation with a high repetition rate of laser pulses was studied. Particular attention is paid to the change in the fluorescent properties of diamond in the irradiation zone. It was found that at a comparable etching rate (10–7–10–4 nm/pulse), nanosecond exposure does not lead to the generation of color centers (in particular, NV centers), which are produced in significant quantities when exposed to femtosecond pulses. The features of ultra-nanoablation at low pressures were analyzed; a noticeable change in the optical properties of the diamond surface in the impact zone was noted for the first time, which is associated with the formation of surface nanorelief and quasi-periodic structures (~100 nm).