Emphasis-Based Extraction of Patent Differences Using Small Language Model
This study investigates the extraction of differences unique to the application invention using small LLMs under resource-constrained environments. Given technically similar invention pairs annotated with emphasis markers(**), the task is explicitly defined as selectively identifying only those differences that are emphasized and unique to the Application Invention. We compare Baseline, Prompt Engineering, and Fine-tuning approaches using Qwen2.5-14B. Experimental results show that Prompt Engineering and Fine-tuning outperform the Baseline, with the fine-tuned small model slightly exceeding the baseline performance of GPT-OSS-120B, indicating that task-specific adaptation can offset model scale limitations.
Authors
- Jinwoo Park (ORCID: https://orcid.org/0000-0002-8544-1643)
- Bonggun Lee
- BongSoo Ko
- HyeonJin Lee
Publication Details
- Journal
- Journal of Korea Multimedia Society
- Published
- 2026-03-31
- DOI
- https://doi.org/10.9717/kmms.2026.29.3.593
- Primary Topic
- Intellectual Property and Patents
- Type
- article
- Field-Weighted Citation Impact
- 0.00