First-principles insights into WS2/4H-SiC heterostructure

This work investigates the structural and electronic characteristics of the WS 2 /4H-SiC heterostructure through first-principles calculations using density functional theory (DFT). To obtain reliable bandgap values, the hybrid HSE06 functional along with norm-conserving pseudopotentials was employed. The computational setup included a plane-wave cutoff energy of 500 eV and a 5 × 5 × 1 Monkhorst-Pack k-point grid for Brillouin zone (BZ) integration. Full structural relaxation yielded lattice constants of a = b = 3.065 Å and c = 22.99 Å, with interaxial angles α = β = 90° and γ = 120°, confirming a stable layered hexagonal configuration. The electronic band structure displays an indirect gap of ∼40.2 meV, indicative of semi-metallic behavior. The projected density of states (PDOS) reveals the orbital hybridization between WS 2 and SiC, particularly near the Fermi level. Therefore, the WS 2 /4H-SiC interface demonstrates strong electronic interaction, making it a viable material platform for next-generation nanoelectronics and high-performance power devices. • DFT-HSE06 reveals stable WS 2 /4H-SiC heterostructure with hexagonal symmetry. • Semi-metallic behavior observed with a small indirect bandgap (∼40 meV). • Strong orbital hybridization enhances interlayer electronic interactions. • Favorable charge transport supports next-gen power and optoelectronics. • Promising platform for high breakdown voltage and thermal stability devices.

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Publication Details

Journal
Next Materials
Published
2026-04-17
DOI
https://doi.org/10.1016/j.nxmate.2026.102057
Primary Topic
2D Materials and Applications
Type
article
Field-Weighted Citation Impact
0.00

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article

First-principles insights into WS2/4H-SiC heterostructure

Geoffrey Tse, Jong‐Min Oh, C. V. R. K. Prasad, Chang-Jun Park et al.
Next Materials
2D Materials and Applications
article

First-principles insights into WS2/4H-SiC heterostructure

Geoffrey Tse, Jong‐Min Oh, C. V. R. K. Prasad, Chang-Jun Park, Jin‐Woo Choi, Geon‐Hee Lee, Sang‐Mo Koo, Manish Taunk, Rajiv K. Pandey, Thomas Ebel, Nilesh Kumar Jaiswal, Ye-jin Kim, S. Damodaraiah, Sunil Kumar
article en

Abstract

This work investigates the structural and electronic characteristics of the WS 2 /4H-SiC heterostructure through first-principles calculations using density functional theory (DFT). To obtain reliable bandgap values, the hybrid HSE06 functional along with norm-conserving pseudopotentials was employed. The computational setup included a plane-wave cutoff energy of 500 eV and a 5 × 5 × 1 Monkhorst-Pack k-point grid for Brillouin zone (BZ) integration. Full structural relaxation yielded lattice constants of a = b = 3.065 Å and c = 22.99 Å, with interaxial angles α = β = 90° and γ = 120°, confirming a stable layered hexagonal configuration. The electronic band structure displays an indirect gap of ∼40.2 meV, indicative of semi-metallic behavior. The projected density of states (PDOS) reveals the orbital hybridization between WS 2 and SiC, particularly near the Fermi level. Therefore, the WS 2 /4H-SiC interface demonstrates strong electronic interaction, making it a viable material platform for next-generation nanoelectronics and high-performance power devices. • DFT-HSE06 reveals stable WS 2 /4H-SiC heterostructure with hexagonal symmetry. • Semi-metallic behavior observed with a small indirect bandgap (∼40 meV). • Strong orbital hybridization enhances interlayer electronic interactions. • Favorable charge transport supports next-gen power and optoelectronics. • Promising platform for high breakdown voltage and thermal stability devices.

Next MaterialsVol. 12
Chandigarh University (IN), Gachon University (KR), Kwangwoon University (KR), University of Southern Denmark (DK), Sejong University (KR), Beijing Academy of Quantum Information Sciences (CN), Jawaharlal Nehru Technological University Anantapur (IN)
National Research Foundation, Kwangwoon University, Ministry of Trade, Industry and Energy, Samsung
Openalex Percentile: Top 24%
2D Materials and Applications
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