Retention improvement in vertical NAND flash memory using block soft erase scheme

We propose a block soft erase method to enhance the retention characteristics of vertical NAND (V-NAND) flash memory while significantly reducing soft erase time. Unlike prior incremental-step-pulse-erasing-based approaches that adjust each cell individually, the proposed method applies a single soft erase pulse to all cells simultaneously. Experimental results using commercial triple-level-cell V-NAND flash memory show that the block soft erase method enables Vth tuning across multiple program-verify levels (PVs), even under cell-to-cell variation due to word-line position and string differences. Retention characteristics measured at 85 °C demonstrated a 21.6% improvement at PV7 after 104 s.

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Publication Details

Journal
Applied Physics Letters
Published
2026-04-13
DOI
https://doi.org/10.1063/5.0310928
Primary Topic
Advanced Data Storage Technologies
Type
article
Field-Weighted Citation Impact
0.00

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article

Retention improvement in vertical NAND flash memory using block soft erase scheme

Yeongheon Yang, Sungho Park, Jong‐Ho Lee, Dongbeen Shin et al.
Applied Physics Letters
Advanced Data Storage Technologies
article

Retention improvement in vertical NAND flash memory using block soft erase scheme

Yeongheon Yang, Sungho Park, Jong‐Ho Lee, Dongbeen Shin, Mingyun Oh, Gyuweon Jung
article en

Abstract

We propose a block soft erase method to enhance the retention characteristics of vertical NAND (V-NAND) flash memory while significantly reducing soft erase time. Unlike prior incremental-step-pulse-erasing-based approaches that adjust each cell individually, the proposed method applies a single soft erase pulse to all cells simultaneously. Experimental results using commercial triple-level-cell V-NAND flash memory show that the block soft erase method enables Vth tuning across multiple program-verify levels (PVs), even under cell-to-cell variation due to word-line position and string differences. Retention characteristics measured at 85 °C demonstrated a 21.6% improvement at PV7 after 104 s.

Applied Physics LettersVol. 128(15)
SK Group (United States) (US), Seoul National University (KR)
SK Hynix, Seoul National University
Openalex Percentile: Top 15%
Advanced Data Storage Technologies
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Retention improvement in vertical NAND flash memory using block soft erase scheme — Yeongheon Yang, Sungho Park, et al. · Applied Physics Letters (2026) | TGRS Research Map | TGRS