Enhancing the Tribological Performance of <scp>PLA</scp> via Process‐Induced Functional Grading in Masked Stereolithography

ABSTRACT Masked stereolithography (MSLA) enables high‐resolution fabrication of photopolymer components; however, the limited tribological performance of neat resins restricts their applicability under sliding conditions. In this study, the wear behavior of PLA‐based photopolymer specimens produced via MSLA was systematically investigated in terms of production configuration (uniform, UNI; functionally graded layer, FGL), layer thickness (0.05 and 0.1 mm), post‐curing (PC), and load level (10 and 20 N). A print‐pause‐print exposure strategy was applied in FGL specimens by varying the layer exposure time (24–3 s) through the thickness to induce a gradient structure without external reinforcement. Dry sliding wear tests were evaluated using specific wear rate (SWR) and coefficient of friction (COF), and the results were statistically analyzed using the Taguchi method and ANOVA. Production configuration was identified as the dominant factor affecting wear performance, contributing 91.69% to the total variance, whereas layer thickness and load level showed comparatively lower contributions. Increasing load increased wear rate, while post‐curing reduced surface damage and debris formation. Compared to UNI specimens, FGL samples exhibited narrower wear tracks and more regular surface morphology, and the lowest SWR values were obtained in FGL‐PC specimens. SEM analyses confirmed that abrasive wear was the dominant mechanism under all conditions. Overall, optimizing production configuration and curing conditions in MSLA‐fabricated photopolymers significantly enhances wear resistance without additional fillers.