Fabrication effects on niobium oxidation and surface contamination in niobium-metal bilayers using x-ray photoelectron spectroscopy

Superconducting resonators and qubits are limited by dielectric losses from surface oxides. Surface oxides are mitigated through various strategies such as the addition of a metal capping layer, surface passivation, and acid processing. In this study, we demonstrate the use of x-ray photoelectron spectroscopy as a rapid characterization tool to study the effectiveness of cap layers for niobium for further device fabrication. We non-destructively evaluate 17 capping layers to characterize their ability to prevent oxygen diffusion and the effects of standard fabrication processes—annealing, resist stripping, and acid cleaning. We downselect for resilient capping layers and test their microwave resonator performance.

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Publication Details

Journal
AIP Advances
Published
2026-04-01
DOI
https://doi.org/10.1063/5.0325433
Primary Topic
Advanced Electron Microscopy Techniques and Applications
Type
article
Field-Weighted Citation Impact
0.00

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article

Fabrication effects on niobium oxidation and surface contamination in niobium-metal bilayers using x-ray photoelectron spectroscopy

Tathagata Banerjee, Valla Fatemi, Maciej W. Olszewski
AIP Advances
Advanced Electron Microscopy Techniques and Applications
article

Fabrication effects on niobium oxidation and surface contamination in niobium-metal bilayers using x-ray photoelectron spectroscopy

Tathagata Banerjee, Valla Fatemi, Maciej W. Olszewski
article en

Abstract

Superconducting resonators and qubits are limited by dielectric losses from surface oxides. Surface oxides are mitigated through various strategies such as the addition of a metal capping layer, surface passivation, and acid processing. In this study, we demonstrate the use of x-ray photoelectron spectroscopy as a rapid characterization tool to study the effectiveness of cap layers for niobium for further device fabrication. We non-destructively evaluate 17 capping layers to characterize their ability to prevent oxygen diffusion and the effects of standard fabrication processes—annealing, resist stripping, and acid cleaning. We downselect for resilient capping layers and test their microwave resonator performance.

AIP AdvancesVol. 16(4)
Cornell University (US)
National Science Foundation, Air Force Office of Scientific Research
Openalex Percentile: Top 19%
Advanced Electron Microscopy Techniques and Applications
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