Leakage-Induced Space-Charge Accumulation and Interfacial Field Redistribution in a Dielectric Nanocapacitor Revealed by <i>Operando</i> Electron Holography

framework based on electron holography for probing nanoscale electrical properties and disentangling competing leakage mechanisms in advanced micro- and nanoscale capacitors.

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Publication Details

Journal
Nano Letters
Published
2026-04-13
DOI
https://doi.org/10.1021/acs.nanolett.6c00753
Primary Topic
Advanced Electron Microscopy Techniques and Applications
Type
article
Field-Weighted Citation Impact
0.00

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article

Leakage-Induced Space-Charge Accumulation and Interfacial Field Redistribution in a Dielectric Nanocapacitor Revealed by Operando Electron Holography

Kilian Gruel, Christophe Gatel, Martin Hÿtch, L Zhang et al.
Nano Letters
Advanced Electron Microscopy Techniques and Applications
article

Leakage-Induced Space-Charge Accumulation and Interfacial Field Redistribution in a Dielectric Nanocapacitor Revealed by Operando Electron Holography

Kilian Gruel, Christophe Gatel, Martin Hÿtch, L Zhang, R. Serra, Bérangère Disic
article en

Abstract

framework based on electron holography for probing nanoscale electrical properties and disentangling competing leakage mechanisms in advanced micro- and nanoscale capacitors.

Nano LettersVol. 26(15)
Centre National de la Recherche Scientifique (FR), Université Fédérale de Toulouse Midi-Pyrénées (FR), Commissariat à l'Énergie Atomique et aux Énergies Alternatives (FR), CEA Grenoble (FR), Spintronique et Technologie des Composants (FR), Université Grenoble Alpes (FR)
Agence Nationale de la Recherche, H2020 Research Infrastructures
Climate action
Openalex Percentile: Top 15%
Advanced Electron Microscopy Techniques and Applications
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