Mechanism of Tungsten Film Adhesion Enhancement on Alumina Ceramics via Microgroove Spacing During Multi-Abrasive Scratching

During the high-temperature deposition of tungsten thin films on alumina ceramic substrates, the inherent mismatch in thermal expansion coefficients frequently triggers interfacial delamination, where uncontrollable factors in stochastic surface topographies can exacerbate localized stress concentrations. To resolve these interfacial failures, the enhancement of interfacial adhesion through a deterministic surface microgroove design is identified as the general objective of the present research. Within this framework, the establishment of a robust quantitative mapping between the transverse scratching offset distances and the resultant periodic microgeometry is first pursued as a specific experimental objective. This methodological approach effectively transforms the stochastic nature of the substrate into deterministic geometric configurations. Second, a specific numerical objective is fulfilled by evaluating the interfacial stress redistribution and damage evolution utilizing refined thermomechanical coupled simulations based on the cohesive zone model. The integrated findings demonstrate that optimizing the microgroove spacing effectively governs the morphological transition and broadens stress diffusion pathways to mitigate thermal mismatch effects. Specifically, the structural optimization at a spacing of 28.8 µm facilitates an approximately 31.8% reduction in the maximum interfacial stress and a 10% decrease in the average film stress compared to the 13.6 µm spacing. Finally, this research clarifies the underlying mechanisms of stress buffering and provides a rigorous engineering methodology for the structural design of reliable high-performance ceramic-metal interfaces in extreme environments.