Impact of Purge Regime and Reactor Volume on ALD ZnO and ZrO2 Growth: From Structural Properties to Applications

. Importantly, these results demonstrate that purge-mode engineering provides a powerful and cost-effective route for tailoring oxide film structure without altering the precursor chemistry or deposition temperature. To validate the practical integration of these optimized films, functional phosphor and LED structures were fabricated, confirming that the controlled microstructure is well-suited for optoelectronic applications. This approach also offers new possibilities for controlling film properties in sensors and catalysts.