Facile, etch-free atomic layer-coated resist templates for rapid prototyping of efficient visible metasurfaces

coating reveal a fourfold improvement in diffraction efficiency, validating the critical role of the high-index shell. The proposed method can offer a robust route to the prototype-to-production of flat optical components for next-generation display, imaging, and photonic systems.

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Publication Details

Journal
Microsystems & Nanoengineering
Published
2026-04-13
DOI
https://doi.org/10.1038/s41378-026-01238-9
Primary Topic
Nanofabrication and Lithography Techniques
Type
article
Field-Weighted Citation Impact
0.00

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article

Facile, etch-free atomic layer-coated resist templates for rapid prototyping of efficient visible metasurfaces

Junhwa Seong, Yong‐Sang Ryu, Jihwan An, Seokwoo Kim et al.
Microsystems & Nanoengineering
Nanofabrication and Lithography Techniques
article

Facile, etch-free atomic layer-coated resist templates for rapid prototyping of efficient visible metasurfaces

Junhwa Seong, Yong‐Sang Ryu, Jihwan An, Seokwoo Kim, Youngsun Jeon, Chanbeom Jeon, Sangwon Lee, Junsuk Rho, Jaekyung Kim
article en

Abstract

coating reveal a fourfold improvement in diffraction efficiency, validating the critical role of the high-index shell. The proposed method can offer a robust route to the prototype-to-production of flat optical components for next-generation display, imaging, and photonic systems.

Microsystems & NanoengineeringVol. 12(1)
Pohang University of Science and Technology (KR), Pohang Iron and Steel (South Korea) (KR), Korea University (KR)
National Research Foundation, Pohang University of Science and Technology, Ministry of Trade, Industry and Energy, Korea Health Industry Development Institute, Ministry of Education, India, Ministry of Science and ICT, South Korea, Advanced Research Projects Agency, Korea Evaluation Institute of Industrial Technology
Climate action
Openalex Percentile: Top 28%
Nanofabrication and Lithography Techniques
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