Intrinsic nanoscale ordering and strain–defect coupling in ferroelectric Al1 <b>−</b> xScxN
Al1−xScxN (AlScN) has emerged as a promising ferroelectric material for next-generation memory and logic devices; yet its performance remains limited by poor understanding of nanoscale structural instabilities. Here, we uncover intrinsic short-range chemical ordering and strain–defect coupling in molecular-beam-epitaxy grown Al0.66Sc0.34N using a combination of atom probe tomography and transmission electron microscopy. The heterostructure exhibits wurtzite structure with a sharp and clean AlScN/AlN interface with negligible interdiffusion. Frequency distribution and radial distribution analyses reveal statistically significant Sc–Sc enrichment and Sc–N depletion, indicating nanoscale clustering accompanied by local nitrogen deficiency. Corresponding lattice-spacing variations observed by inverse FFT mapping confirm strain variation correlated with Sc-rich domains. These results provide the first atom-by-atom experimental evidence of scandium clustering and its coupling to nitrogen-vacancy formation in the ferroelectric composition regime. These findings identify short-range ordering and strain–defect coupling as intrinsic structural features of ferroelectric AlScN, with important implications for polarization switching behavior and reliability.
Authors
- Baishakhi Mazumder (ORCID: https://orcid.org/0000-0003-1748-5297)
- Debdeep Jena (ORCID: https://orcid.org/0000-0002-4076-4625)
- Chandrashekhar Savant (ORCID: https://orcid.org/0000-0001-7174-1103)
- Huili Grace Xing (ORCID: https://orcid.org/0000-0002-2709-3839)
- Shaon Das (ORCID: https://orcid.org/0000-0002-2160-6058)
- Karthick Gothandapani
Institutions
- Cornell University (US)
- University at Buffalo, State University of New York (US)
Publication Details
- Journal
- Applied Physics Letters
- Published
- 2026-04-06
- DOI
- https://doi.org/10.1063/5.0325478
- Primary Topic
- Force Microscopy Techniques and Applications
- Type
- article
- Field-Weighted Citation Impact
- 0.00
Funders
- Semiconductor Research Corporation
- Division of Materials Research