Efficient Carrier Tunneling and Weak Fermi-Level Pinning Enabled by Intrinsic Covalent-like Quasi-bonding Interactions in van der Waals Metal–Semiconductor Junctions

/WSTe junction can be tuned into a p-type ohmic contact under combined strain and electric field, achieving an ultralow resistance of 73.28-77.63 Ω·μm at the same carrier density. This work underscores the critical role of the inherent orbital characteristics of metal electrodes in interfacial coupling with 2D semiconductors, offering a key descriptor for selecting contact metals to obtain high-performance vdW 2D MSJs with an optimal balance between carrier tunneling efficiency and Fermi-level pinning.

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Publication Details

Journal
ACS Applied Materials & Interfaces
Published
2026-04-03
DOI
https://doi.org/10.1021/acsami.6c01726
Primary Topic
2D Materials and Applications
Type
article
Field-Weighted Citation Impact
0.00

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article

Efficient Carrier Tunneling and Weak Fermi-Level Pinning Enabled by Intrinsic Covalent-like Quasi-bonding Interactions in van der Waals Metal–Semiconductor Junctions

Cai-hong Wen, Yun-Ya Zhong, Da-Wei Deng, Jin Yuan et al.
ACS Applied Materials & Interfaces
2D Materials and Applications
article

Efficient Carrier Tunneling and Weak Fermi-Level Pinning Enabled by Intrinsic Covalent-like Quasi-bonding Interactions in van der Waals Metal–Semiconductor Junctions

Cai-hong Wen, Yun-Ya Zhong, Da-Wei Deng, Jin Yuan, Jian-Qing Dai
article en

Abstract

/WSTe junction can be tuned into a p-type ohmic contact under combined strain and electric field, achieving an ultralow resistance of 73.28-77.63 Ω·μm at the same carrier density. This work underscores the critical role of the inherent orbital characteristics of metal electrodes in interfacial coupling with 2D semiconductors, offering a key descriptor for selecting contact metals to obtain high-performance vdW 2D MSJs with an optimal balance between carrier tunneling efficiency and Fermi-level pinning.

ACS Applied Materials & InterfacesVol. 18(14)
Kunming University of Science and Technology (CN), Faculty (United Kingdom) (GB), Division of Materials Science and Engineering (AU)
National Natural Science Foundation of China
Openalex Percentile: Top 28%
2D Materials and Applications
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