Ion beam mixing effects in focused ion beam time-of-flight secondary ion mass spectrometry
Time-of-flight secondary ion mass spectrometry (ToF-SIMS) is one of the most precise techniques for measuring elemental composition and is suitable for light elements where other methods, such as x-ray energy dispersive spectroscopy, struggle. Coupled with the spatial resolution available in a focused ion beam (FIB), FIB ToF-SIMS is potentially very powerful for characterization of materials with wide-ranging applications from batteries to biomaterials. One important limitation of FIB ToF-SIMS measurements is ion beam interaction with the sample. We report that ion beam induced mixing in metallic bilayer thin films systematically exhibits correlation with the heat of mixing of the binary alloys. Our results suggest that maximum spatial resolution is obtained by minimizing ion beam interactions with the sample.
Authors
- Somayeh Saadat Niavol (ORCID: https://orcid.org/0000-0001-7615-5330)
- Andrew C. Meng (ORCID: https://orcid.org/0000-0002-3060-8928)
- Dilan M. Gamachchi (ORCID: https://orcid.org/0000-0003-1517-839X)
- David Stalla
- Carson Ziemke
- Harrison C. Davison
- Carter T. Davidson
- Vishvi N. Aurora
- Patricia A. Denn
- Jackson M. Miller
- Wyatt B. Vandendaele
- Bryce D. Stoddard
Institutions
- University of Missouri (US)
Publication Details
- Journal
- Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena
- Published
- 2026-04-02
- DOI
- https://doi.org/10.1116/6.0005267
- Primary Topic
- Ion-surface interactions and analysis
- Type
- article
- Field-Weighted Citation Impact
- 0.00
Funders
- University of Missouri