Improving the sputtered titanium film for the NIK ceramic chamber in TPS

The development of the Nonlinear In-vacuum Kicker (NIK) is one of the key projects of the Taiwan Photon Source (TPS). Efficient conduction of the image current generated by the stored beam requires the deposition of a highly conductive titanium thin film on the inner surface of the NIK ceramic chamber. Based on tests involving the sputtering of a 5.5 μm titanium film onto a 34 cm × 6 cm ceramic substrate, the uniformity of the titanium film was controlled within 5%. The adhesion strength between the titanium film and the ceramic substrate reached 60 MPa, and the electrical resistivity was measured at 7.2 × 10⁻⁵ Ω·cm. This paper presents a detailed overview of the coating system, experimental methodology, and test results.