Transient Thermal Nitridation of Solution-processable Mesoporous Niobium Oxide to Niobium Nitride using Laser Spike Annealing

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Journal
eCommons (Cornell University)
Published
2026-04-02
DOI
https://doi.org/10.7298/e3wj-9x04
Primary Topic
Semiconductor materials and devices
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article
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article

Transient Thermal Nitridation of Solution-processable Mesoporous Niobium Oxide to Niobium Nitride using Laser Spike Annealing

Abhishek Kulkarni
eCommons (Cornell University)
Semiconductor materials and devices
article

Transient Thermal Nitridation of Solution-processable Mesoporous Niobium Oxide to Niobium Nitride using Laser Spike Annealing

Abhishek Kulkarni
article en

Abstract

No abstract available for this paper.
eCommons (Cornell University)
Cornell University (US)
Openalex Percentile: Top 25%
Semiconductor materials and devices
DOIOpen Access PDFOpenAlex
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Transient Thermal Nitridation of Solution-processable Mesoporous Niobium Oxide to Niobium Nitride using Laser Spike Annealing — Abhishek Kulkarni · eCommons (Cornell University) (2026) | TGRS Research Map | TGRS