All-Oxide ITO/HZO/WO <sub> <i>x</i> </sub> Ferroelectric Tunnel Junctions with Oxygen-Engineered Interfaces for Highly Endurable Neuromorphic Computing

cycles, and 64 well-resolved conductance states. The device further demonstrates stable spike-dependent plasticity and reliable analog weight modulation suitable for neuromorphic operation. Neural-network simulations based on experimentally extracted conductance characteristics achieve 91.5% accuracy on the MNIST data set, highlighting the potential of simple MFM FTJ synapses for scalable neuromorphic and in-memory computing hardware.

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Publication Details

Journal
ACS Applied Materials & Interfaces
Published
2026-03-31
DOI
https://doi.org/10.1021/acsami.6c00989
Primary Topic
Ferroelectric and Negative Capacitance Devices
Type
article
Field-Weighted Citation Impact
0.00

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article

All-Oxide ITO/HZO/WO x Ferroelectric Tunnel Junctions with Oxygen-Engineered Interfaces for Highly Endurable Neuromorphic Computing

Y.J. Choi, Seungjoon Jeong, Huiseong Shin, Myeongjae Choi et al.
ACS Applied Materials & Interfaces
Ferroelectric and Negative Capacitance Devices
article

All-Oxide ITO/HZO/WO x Ferroelectric Tunnel Junctions with Oxygen-Engineered Interfaces for Highly Endurable Neuromorphic Computing

Y.J. Choi, Seungjoon Jeong, Huiseong Shin, Myeongjae Choi, Hyeonjung Park, Changwoo Han, Changhwan Shin, Junseok Kim
article en

Abstract

cycles, and 64 well-resolved conductance states. The device further demonstrates stable spike-dependent plasticity and reliable analog weight modulation suitable for neuromorphic operation. Neural-network simulations based on experimentally extracted conductance characteristics achieve 91.5% accuracy on the MNIST data set, highlighting the potential of simple MFM FTJ synapses for scalable neuromorphic and in-memory computing hardware.

ACS Applied Materials & InterfacesVol. 18(14)
Samsung (South Korea) (KR), Sungkyunkwan University (KR)
Ministry of Trade, Industry and Energy, National Research Foundation of Korea
Openalex Percentile: Top 39%
Ferroelectric and Negative Capacitance Devices
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