Realization of a Full-Color Micro-LED Display via Nano-Phosphor Photolithographic Patterning
Realizing high-resolution, full-color Micro-LED displays remains a central challenge due to the difficulty of integrating red, green, and blue (RGB) emission with scalable and manufacturable processes. In this work, we report the successful fabrication of a full-color Micro-LED display device based on photolithographically patterned nanophosphor thin films, a prepatterned color filter array, and a blue-emitting Micro-LED panel. The nanophosphor layers were precisely aligned to the subpixel layout via lithographic processes, enabling pixel-level color conversion with strong emission confinement and minimal crosstalk. The integrated display exhibits uniform RGB output, an internal quantum efficiency of ∼86% for the phosphor layer, >99% thermal emission recovery after 150 °C exposure, and a chromaticity white point close to the D65 standard. These results demonstrate a fully realized, manufacturable full-color Micro-LED display platform that is both scalable and suitable for high-performance applications such as AR/VR and compact visual systems.
Authors
- Wenni Bai
- Zengzhi Pei
- Asim Mohammed A. Noor Elahi
- Justin Otto
- Jian Xu
Institutions
- Pennsylvania State University (US)
- SPX Corporation (United States) (US)
Publication Details
- Journal
- ACS Photonics
- Published
- 2026-04-01
- DOI
- https://doi.org/10.1021/acsphotonics.5c02542
- Primary Topic
- GaN-based semiconductor devices and materials
- Type
- article
- Field-Weighted Citation Impact
- 0.00