TE-pass polarizer with high polarization extinction ratio based on thin-film lithium niobate

A compact on-chip polarizer with a high polarization extinction ratio is proposed and experimentally demonstrated on thin-film lithium niobate (TFLN). The device consists of a dual-taper structure and a dual-side asymmetric directional coupler (ADC) to enable efficient polarization separation. Experimental results show an average insertion loss below 0.5 dB over the wavelength range from 1500 to 1600 nm, while a polarization extinction ratio (PER) exceeding 20 dB is maintained across 1505-1575 nm, reaching a maximum of 43 dB at 1550 nm. With a compact footprint of only 193 µm and full compatibility with standard TFLN fabrication processes, the proposed polarizer provides an effective approach for polarization management in integrated photonic circuits.

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Publication Details

Journal
Optics Letters
Published
2026-03-31
DOI
https://doi.org/10.1364/ol.590986
Primary Topic
Photorefractive and Nonlinear Optics
Type
article
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article

TE-pass polarizer with high polarization extinction ratio based on thin-film lithium niobate

Tianheng Zhang, Changren Nie, Tiancheng Zheng, Youwen Zhang et al.
Optics Letters
Photorefractive and Nonlinear Optics
article

TE-pass polarizer with high polarization extinction ratio based on thin-film lithium niobate

Tianheng Zhang, Changren Nie, Tiancheng Zheng, Youwen Zhang, Junqiang Sun
article en

Abstract

A compact on-chip polarizer with a high polarization extinction ratio is proposed and experimentally demonstrated on thin-film lithium niobate (TFLN). The device consists of a dual-taper structure and a dual-side asymmetric directional coupler (ADC) to enable efficient polarization separation. Experimental results show an average insertion loss below 0.5 dB over the wavelength range from 1500 to 1600 nm, while a polarization extinction ratio (PER) exceeding 20 dB is maintained across 1505-1575 nm, reaching a maximum of 43 dB at 1550 nm. With a compact footprint of only 193 µm and full compatibility with standard TFLN fabrication processes, the proposed polarizer provides an effective approach for polarization management in integrated photonic circuits.

Optics LettersVol. 51(8)
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Photorefractive and Nonlinear Optics
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