Ferroelectric Charging Tunnel Junctions: Resolving Transport Trade‐Offs via Trap‐Assisted Barrier Modulation for Physical Reservoir Computing

ABSTRACT Dynamic memristors that combine a wide dynamic range, intrinsic self‐rectification, and rich temporal dynamics are key building blocks for physical reservoir computing, but state‐of‐the‐art HfO 2 ‐based ferroelectric tunnel junctions (FTJs) suffer from thickness‐limited transport trade‐offs and poorly resolved conduction mechanisms. Here, a ferroelectric charging tunnel junction (FCTJ) based on an IGZO/HZO stack is demonstrated as a scalable two‐terminal reservoir node. Introducing a carrier‐charging IGZO interlayer into a W/HZO/W stack modulates the tunneling barrier and couples ferroelectric polarization to interface oxygen‐vacancy trapping, yielding both an I on /I off and a rectification ratio exceeding 10 4 and satisfying over 10% read margin in N x N passive crossbar arrays with N = 2000. Temperature‐ and time‐dependent transport, XPS depth profiling, and conductance‐method analysis quantitatively link shallow, while reverse leakage is suppressed by depletion and oxygen‐reservoir effects in IGZO. These composite ferroelectric–trapping dynamics support multi‐timescale synaptic plasticity with modest variability. Leveraging experimentally calibrated device dynamics, FCTJ‐based physical reservoirs outperform a multilayer perceptron using only quasi‐static conductance states for MNIST classification and accurately process UCR gesture signals and chaotic Hénon/Lorenz trajectories with low prediction error. This work establishes IGZO/HZO FCTJs as CMOS‐compatible reservoir nodes and outlines a general design strategy for ferroelectric and oxide‐based physical reservoir computing hardware.

Authors

Institutions

Publication Details

Journal
Advanced Functional Materials
Published
2026-03-31
DOI
https://doi.org/10.1002/adfm.75198
Primary Topic
Ferroelectric and Negative Capacitance Devices
Type
article
Field-Weighted Citation Impact
0.00

Funders

Controls
|||
ALL TIME
JAN
FEB
MAR
APR
MAY
JUN
JUL
AUG
SEP
OCT
article

Ferroelectric Charging Tunnel Junctions: Resolving Transport Trade‐Offs via Trap‐Assisted Barrier Modulation for Physical Reservoir Computing

D. S. Kim, Sa C. Shin, Junseok Kim, Y.J. Choi et al.
Advanced Functional Materials
Ferroelectric and Negative Capacitance Devices
article

Ferroelectric Charging Tunnel Junctions: Resolving Transport Trade‐Offs via Trap‐Assisted Barrier Modulation for Physical Reservoir Computing

D. S. Kim, Sa C. Shin, Junseok Kim, Y.J. Choi, Seungjoon Jeong, Huiseong Shin, Myeongjae Choi, Changwoo Han, Hyeonjung Park, Sehee Kim
article en

Abstract

ABSTRACT Dynamic memristors that combine a wide dynamic range, intrinsic self‐rectification, and rich temporal dynamics are key building blocks for physical reservoir computing, but state‐of‐the‐art HfO 2 ‐based ferroelectric tunnel junctions (FTJs) suffer from thickness‐limited transport trade‐offs and poorly resolved conduction mechanisms. Here, a ferroelectric charging tunnel junction (FCTJ) based on an IGZO/HZO stack is demonstrated as a scalable two‐terminal reservoir node. Introducing a carrier‐charging IGZO interlayer into a W/HZO/W stack modulates the tunneling barrier and couples ferroelectric polarization to interface oxygen‐vacancy trapping, yielding both an I on /I off and a rectification ratio exceeding 10 4 and satisfying over 10% read margin in N x N passive crossbar arrays with N = 2000. Temperature‐ and time‐dependent transport, XPS depth profiling, and conductance‐method analysis quantitatively link shallow, while reverse leakage is suppressed by depletion and oxygen‐reservoir effects in IGZO. These composite ferroelectric–trapping dynamics support multi‐timescale synaptic plasticity with modest variability. Leveraging experimentally calibrated device dynamics, FCTJ‐based physical reservoirs outperform a multilayer perceptron using only quasi‐static conductance states for MNIST classification and accurately process UCR gesture signals and chaotic Hénon/Lorenz trajectories with low prediction error. This work establishes IGZO/HZO FCTJs as CMOS‐compatible reservoir nodes and outlines a general design strategy for ferroelectric and oxide‐based physical reservoir computing hardware.

Advanced Functional Materials
Korea University (KR), Samsung (South Korea) (KR), Seoul Semiconductor (South Korea) (KR), Sungkyunkwan University (KR)
National Research Foundation of Korea
Openalex Percentile: Top 15%
Ferroelectric and Negative Capacitance Devices
AI Navigator

Ask Laika to Summarize, Analyze, and Connect papers live on the map.

Summarize Papers & Methodologies

Extract key findings, datasets, and comparative methods across publications.

Benchmark Rankings & Visual Analytics

Rank top research institutions, authors, funders, topics, and journals by Field-Weighted Citation Impact (FWCI) and paper volume with instant charts.

Connect Distant Disciplines

Bridge topological clusters on the map to find hidden collaborative intersections.