Comprehensive Study of Ultrathin TiN Films by ALD: Influence of Film Thickness and Substrate on Composition, Structure, Sheet resistance and Durability

This study investigates ultrathin Titanium nitride (TiN) films in terms of their crystallographic structure, surface chemistry, Sheet resistance and mechanical durability. These TiN ultrathin films were created by Atomic Layer...

Publication Details

Journal: Nanoscale Advances
Published: 2026-01-01
DOI: https://doi.org/10.1039/d5na01134e
Primary Topic: Metal and Thin Film Mechanics
Type: article
Field-Weighted Citation Impact: 0.00

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article

Comprehensive Study of Ultrathin TiN Films by ALD: Influence of Film Thickness and Substrate on Composition, Structure, Sheet resistance and Durability

Jan 1, 2026

Nanoscale Advances

Metal and Thin Film Mechanics

article

Comprehensive Study of Ultrathin TiN Films by ALD: Influence of Film Thickness and Substrate on Composition, Structure, Sheet resistance and Durability

January 1, 2026article en

Abstract

Nanoscale Advances

Openalex Percentile: Top 10%

Metal and Thin Film Mechanics

DOI Open Access PDF OpenAlex

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Comprehensive Study of Ultrathin TiN Films by ALD: Influence of Film Thickness and Substrate on Composition, Structure, Sheet resistance and Durability · Nanoscale Advances (2026) | TGRS Research Map | TGRS