The role of nitrogen additive on the growth of ultrathin silver films: in situ and real-time studies during magnetron sputtering deposition

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SPIRE - Sciences Po Institutional REpository
Published
2025-09-22
Primary Topic
Copper Interconnects and Reliability
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article
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article

The role of nitrogen additive on the growth of ultrathin silver films: in situ and real-time studies during magnetron sputtering deposition

F. Pailloux, David Babonneau, Michał Kamiński, Andrea Resta et al.
SPIRE - Sciences Po Institutional REpository
Copper Interconnects and Reliability
article

The role of nitrogen additive on the growth of ultrathin silver films: in situ and real-time studies during magnetron sputtering deposition

F. Pailloux, David Babonneau, Michał Kamiński, Andrea Resta, Y. Garreau, G ABADIAS, Alessandro Coati, B. Krause, Alina Vlad, Karan Solanki, Anny Michel
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No abstract available for this paper.
SPIRE - Sciences Po Institutional REpository
Karlsruhe Institute of Technology (DE), Université Paris Cité (FR), Synchrotron soleil (FR), Institut Pprime (FR), Laboratoire Matériaux et Phénomènes Quantiques (FR)
Openalex Percentile: Top 47%
Copper Interconnects and Reliability
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