Modeling the Growth of Chiral Nanostructures by Glancing Angle Deposition

The work presents a simulation of the growth of chiral nanostructures using the Monte Carlo method. The influence of technological parameters of the sputtering process, such as the deposition angle of the substrate relative to the source of the sputtered material, rotation speed and temperature of the substrate, on the morphology of the resulting chiral nanostructures is shown.