Optimization of Electrostatic-Assisted Ultrasonic Spray Coating of Photoresist Film

In this work we investigate the influence of parameters of electrostatic-assisted ultrasonic spray process on the quality of deposited photoresist film. We have observed forming and drying of liquid film, forming of dried aerosol layer and in situ drying process, according to deposition parameters variation. Best film quality was achieved at the temperature, significantly lower than typical photoresist drying temperature.

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Publication Details

Journal
Russian Microelectronics
Published
2025-12-01
DOI
https://doi.org/10.1134/s1063739725601948
Primary Topic
Aerosol Filtration and Electrostatic Precipitation
Type
article
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article

Optimization of Electrostatic-Assisted Ultrasonic Spray Coating of Photoresist Film

K. A. Tsarik, A. V. Lashkov, V. A. Petukhov
Russian Microelectronics
Aerosol Filtration and Electrostatic Precipitation
article

Optimization of Electrostatic-Assisted Ultrasonic Spray Coating of Photoresist Film

K. A. Tsarik, A. V. Lashkov, V. A. Petukhov
article en

Abstract

In this work we investigate the influence of parameters of electrostatic-assisted ultrasonic spray process on the quality of deposited photoresist film. We have observed forming and drying of liquid film, forming of dried aerosol layer and in situ drying process, according to deposition parameters variation. Best film quality was achieved at the temperature, significantly lower than typical photoresist drying temperature.

Russian MicroelectronicsVol. 54(8)
National Research University of Electronic Technology (RU)
Openalex Percentile: Top 33%
Aerosol Filtration and Electrostatic Precipitation
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