Cryogenic Atomic Layer Etching of Silicon and Silicon Compounds

Authors

Rémi Dussart (ORCID: https://orcid.org/0000-0003-2001-5034)
Philippe Lefaucheux (ORCID: https://orcid.org/0000-0001-7889-8891)
Eva Kovačević (ORCID: https://orcid.org/0000-0002-5747-5790)
Thomas Tillocher (ORCID: https://orcid.org/0000-0002-9160-5595)
Madjib Adjabi
Loic Becerra

Institutions

Groupe de Recherches sur l'Energétique des Milieux Ionisés (FR)

Publication Details

Journal: SPIRE - Sciences Po Institutional REpository
Published: 2025-10-12
Primary Topic: Silicon and Solar Cell Technologies
Type: article
Field-Weighted Citation Impact: 0.00

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article

Cryogenic Atomic Layer Etching of Silicon and Silicon Compounds

Rémi Dussart, Philippe Lefaucheux, Eva Kovačević, Thomas Tillocher et al.

Oct 12, 2025

SPIRE - Sciences Po Institutional REpository

Silicon and Solar Cell Technologies

article

Cryogenic Atomic Layer Etching of Silicon and Silicon Compounds

Rémi Dussart, Philippe Lefaucheux, Eva Kovačević, Thomas Tillocher, Madjib Adjabi, Loic Becerra

October 12, 2025article en

Abstract

No abstract available for this paper.

SPIRE - Sciences Po Institutional REpository

Groupe de Recherches sur l'Energétique des Milieux Ionisés (FR)

Industry, innovation and infrastructure

Openalex Percentile: Top 33%

Silicon and Solar Cell Technologies

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Cryogenic Atomic Layer Etching of Silicon and Silicon Compounds — Rémi Dussart, Philippe Lefaucheux, et al. · SPIRE - Sciences Po Institutional REpository (2025) | TGRS Research Map | TGRS