Renewed interest in cryogenic etching processes: what are the advantages of cooling the substrate ?
Authors
- Rémi Dussart (ORCID: https://orcid.org/0000-0003-2001-5034)
Institutions
- Groupe de Recherches sur l'Energétique des Milieux Ionisés (FR)
Publication Details
- Journal
- SPIRE - Sciences Po Institutional REpository
- Published
- 2025-01-28
- Primary Topic
- Silicon and Solar Cell Technologies
- Type
- article
- Field-Weighted Citation Impact
- 0.00