Interfacial work-function engineering for giant tunneling electroresistance in a Sc <sub>2</sub> CO <sub>2</sub> /Y <sub>2</sub> CO <sub>2</sub> van der Waals ferroelectric tunnel junction

Van der Waals ferroelectric tunnel junctions (FTJs) based on two-dimensional (2D) materials offer a promising platform for next-generation nonvolatile memory, yet achieving ultrahigh tunneling electroresistance (TER) remains a critical challenge. This work demonstrates a giant TER effect of 5.83 × 10<sup>9</sup>% in a vertically stacked FTJ comprising out-of-plane ferroelectric monolayers Sc<sub>2</sub>CO<sub>2</sub>and Y<sub>2</sub>CO<sub>2</sub>. First-principles calculations and quantum transport simulations reveal that the TER originates from interfacial work-function engineering. In the<i>P</i><sub>↓↓</sub>state, a substantial work-function difference (Δ<i>W</i>= 2.35 eV) drives significant charge transfer and yielding high conductance. Conversely, the<i>P</i><sub>↓↑</sub>configuration exhibits a smaller Δ<i>W</i>(0.85 eV), insufficient to overcome the Sc<sub>2</sub>CO<sub>2</sub>band gap. These findings not only propose Sc<sub>2</sub>CO<sub>2</sub>/Y<sub>2</sub>CO<sub>2</sub>as an exceptional candidate for high-performance memory devices but also establish a general interfacial design strategy for achieving colossal TER in low-dimensional ferroelectric systems.

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Journal
Journal of Physics Condensed Matter
Published
2026-03-16
DOI
https://doi.org/10.1088/1361-648x/ae529e
Primary Topic
2D Materials and Applications
Type
article
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article

Interfacial work-function engineering for giant tunneling electroresistance in a Sc 2 CO 2 /Y 2 CO 2 van der Waals ferroelectric tunnel junction

Shuhong Xie, Daifeng Zou, Shiying He
Journal of Physics Condensed Matter
2D Materials and Applications
article

Interfacial work-function engineering for giant tunneling electroresistance in a Sc 2 CO 2 /Y 2 CO 2 van der Waals ferroelectric tunnel junction

Shuhong Xie, Daifeng Zou, Shiying He
article en

Abstract

Van der Waals ferroelectric tunnel junctions (FTJs) based on two-dimensional (2D) materials offer a promising platform for next-generation nonvolatile memory, yet achieving ultrahigh tunneling electroresistance (TER) remains a critical challenge. This work demonstrates a giant TER effect of 5.83 × 10<sup>9</sup>% in a vertically stacked FTJ comprising out-of-plane ferroelectric monolayers Sc<sub>2</sub>CO<sub>2</sub>and Y<sub>2</sub>CO<sub>2</sub>. First-principles calculations and quantum transport simulations reveal that the TER originates from interfacial work-function engineering. In the<i>P</i><sub>↓↓</sub>state, a substantial work-function difference (Δ<i>W</i>= 2.35 eV) drives significant charge transfer and yielding high conductance. Conversely, the<i>P</i><sub>↓↑</sub>configuration exhibits a smaller Δ<i>W</i>(0.85 eV), insufficient to overcome the Sc<sub>2</sub>CO<sub>2</sub>band gap. These findings not only propose Sc<sub>2</sub>CO<sub>2</sub>/Y<sub>2</sub>CO<sub>2</sub>as an exceptional candidate for high-performance memory devices but also establish a general interfacial design strategy for achieving colossal TER in low-dimensional ferroelectric systems.

Journal of Physics Condensed MatterVol. 38(12)
Hunan University of Science and Technology (CN), Beijing Normal University (CN), Xiangtan University (CN)
Openalex Percentile: Top 21%
2D Materials and Applications
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