Spectral unraveling of the EUV light source

One of the key tools to produce computer chips, is the EUV lithography machine of ASML. These tools use 13.5 nm light to produce computer chips. This 13.5 nm light is generated by tin-based laser produced plasma (Sn LPP) sources, which are optimized to generate radiation around 13.5 nm. However, they produce a very broad spectrum that also includes vacuum ultraviolet, deep ultraviolet and visible wavelengths. These out-of-band components affect the performance of the scanner. Furthermore, the full spectrum is important for plasma and surface processes, e.g. ionization of different gases in the scanner and secondary electron emission from surfaces.<br/><br/>We have developed in collaboration with University of Twente a spectrometer that can measure the fullband spectrum. In this contribution, we present the first ever measurement of the full-band spectrum (from 5 till ~300 nm) of a commercial EUV source of ASML. This measured spectrum is compared to the expected spectrum in the EUV scanner and shows reasonable agreement within the confidence bounds.