Magnetic Force Microscopy Signatures of Higher‐Order Skyrmions and Antiskyrmions
ABSTRACT Higher‐order skyrmions and antiskyrmions are topologically protected spin textures with integer topological charges beyond , typically nucleating from vertical Bloch lines in domain walls. Until now, they have been reported only in ferromagnetic multilayers by Lorentz transmission electron microscopy (LTEM), which requires growth on ultrathin membranes and complicates their integration into spintronic devices. Moreover, LTEM often yields contrast patterns that are difficult to unambiguously assign to specific topological charges. Here, we demonstrate that magnetic force microscopy (MFM) operated under vacuum conditions provides a robust route to identify and distinguish higher‐order spin textures in Co/Ni multilayers at room temperature. Supported by micromagnetic simulations, we show that MFM can resolve vertical Bloch lines as well as skyrmions and antiskyrmions with arbitrary charge. Our results establish advanced MFM as a powerful technique for the qualitative classification of complex spin textures, paving the way for their exploration and utilization in future skyrmionic device concepts.
Authors
- M. Albrecht (ORCID: https://orcid.org/0000-0002-0795-8487)
- Emily Darwin (ORCID: https://orcid.org/0000-0002-3933-314X)
- Dieter Suess (ORCID: https://orcid.org/0000-0001-5453-9974)
- Hans J. Hug (ORCID: https://orcid.org/0000-0002-1281-4138)
- T. Karaman
- Joe Sunny (ORCID: https://orcid.org/0009-0007-0581-7756)
- Felix Büttner
- Sabri Koraltan
- Reshma Peremadathil‐Pradeep
Institutions
- University of Vienna (AT)
- TU Wien (AT)
- University of Augsburg (DE)
- University of Basel (CH)
- Helmholtz-Zentrum Berlin für Materialien und Energie (DE)
- Swiss Federal Laboratories for Materials Science and Technology (CH)
Publication Details
- Journal
- Advanced Functional Materials
- Published
- 2026-03-13
- DOI
- https://doi.org/10.1002/adfm.202525716
- Primary Topic
- Magnetic properties of thin films
- Type
- article
- Field-Weighted Citation Impact
- 0.00