Interfacial Self‐Assembly‐Assisted Nanoparticle Imprinting of Plasmonic Gratings with Particle‐Level Precision for Dynamic Flexible Holographic Displays
Plasmonic nanogratings with structural color and diffraction capabilities are essential components of metasurface-based optical systems. However, current methods for fabricating high-fidelity nanograting pixels remain limited in scalability, material compatibility, and adaptability to curved or flexible surfaces. Herein, we present an interfacial self-assembly assisted nanoparticle imprinting (ISA-NPI) strategy for the template-defined fabrication of submicron plasmonic gratings with high structural fidelity and broad substrate compatibility. This method combines self-assembled nanoparticle films with template-guided pattern transfer, enabling precise control over grating geometry, layer number, and interparticle spacing. Large-area characterization confirms millimeter-scale continuity and defect-free nanograting lines, validating the scalability and pattern fidelity of the ISA-NPI process. Integrated into metal-insulator-metal resonator stacks, the nanograting arrays exhibit tunable Fabry-Pérot resonances and angle-selective diffraction with first-order efficiencies up to 60%. This method combines self-assembled nanoparticle films with mold-guided pattern transfer, enabling precise control over grating geometry, layer number, and interparticle spacing.
Authors
- Youju Huang
- Y. F. Liu (ORCID: https://orcid.org/0000-0002-2795-1733)
- Wenkai Zhang (ORCID: https://orcid.org/0000-0002-4885-4043)
- Yang Cheng (ORCID: https://orcid.org/0000-0003-2925-8606)
- Manman Zhang (ORCID: https://orcid.org/0009-0007-3212-0647)
- Chiyu Wang (ORCID: https://orcid.org/0000-0002-6296-779X)
- Jiaqi Li
- Liping Song
Institutions
- Hangzhou Normal University (CN)
- Henan University (CN)
Publication Details
- Journal
- Small
- Published
- 2026-03-12
- DOI
- https://doi.org/10.1002/smll.202510547
- Primary Topic
- Plasmonic and Surface Plasmon Research
- Type
- article
- Field-Weighted Citation Impact
- 0.00