Fundamentals of Chemical Vapor Deposition (CVD) and Atomic Layer Deposition (ALD) and Safety Management of Chemical Substances

Professor Atsushi Sekiguchi, author of this lecture series, worked at Canon Anelva Corporation from 1982 to 2016, where he was involved in the development of chemical vapor deposition (CVD) method. He has also contributed to the educational activities related to vacuum science and technology and thin film as a member of the Education Committee of the Japan Society of Vacuum and Surface Science (JVSS). This lecture series, “Fundamentals of Chemical Vapor Deposition (CVD) and Atomic Layer Deposition (ALD) and Safety Management of Chemical Substances”, introduces key points from the extensive teaching materials he developed over many years of educational work.

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Publication Details

Journal
Vacuum and Surface Science
Published
2026-03-09
DOI
https://doi.org/10.1380/vss.69.165
Primary Topic
Chemical Safety and Risk Management
Type
article
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Fundamentals of Chemical Vapor Deposition (CVD) and Atomic Layer Deposition (ALD) and Safety Management of Chemical Substances

Hajime YOSHIDA
Vacuum and Surface Science
Chemical Safety and Risk Management
article

Fundamentals of Chemical Vapor Deposition (CVD) and Atomic Layer Deposition (ALD) and Safety Management of Chemical Substances

Hajime YOSHIDA
article en

Abstract

Professor Atsushi Sekiguchi, author of this lecture series, worked at Canon Anelva Corporation from 1982 to 2016, where he was involved in the development of chemical vapor deposition (CVD) method. He has also contributed to the educational activities related to vacuum science and technology and thin film as a member of the Education Committee of the Japan Society of Vacuum and Surface Science (JVSS). This lecture series, “Fundamentals of Chemical Vapor Deposition (CVD) and Atomic Layer Deposition (ALD) and Safety Management of Chemical Substances”, introduces key points from the extensive teaching materials he developed over many years of educational work.

Vacuum and Surface ScienceVol. 69(3)
National Institute of Advanced Industrial Science and Technology (JP)
Openalex Percentile: Top 34%
Chemical Safety and Risk Management
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