Achieving High ON State Current through Ferroelectric Polarization‐Dependent Interfacial Resistance Switching in Undoped Orthorhombic HfO2 Films

Authors

Bipin Rajendran (ORCID: https://orcid.org/0000-0002-2960-6909)
Bernardo Mattos Almeida (ORCID: https://orcid.org/0000-0003-3627-6781)
Babak Bakhit (ORCID: https://orcid.org/0000-0002-3083-7536)
Luis Silvino A. Marques
Marian Cosmin Istrate (ORCID: https://orcid.org/0000-0001-6156-6161)
Nives Strkalj (ORCID: https://orcid.org/0000-0001-8293-8577)
Markus Hellenbrand (ORCID: https://orcid.org/0000-0002-5811-5228)
Abin Varghese (ORCID: https://orcid.org/0000-0002-6241-9080)
Ji Soo Kim (ORCID: https://orcid.org/0000-0002-7801-8302)
Nuno Estrócio (ORCID: https://orcid.org/0009-0004-0940-1270)
Corneliu Ghica
Judith L. MacManus‐Driscoll
José P.B. Silva
Tiago Rebelo

Publication Details

Journal: Apollo (University of Cambridge)
Published: 2025-12-19
Primary Topic: Ferroelectric and Negative Capacitance Devices
Type: article
Field-Weighted Citation Impact: 0.00

Funders

Royal Academy of Engineering
Forschungszentrum Jülich
Vetenskapsrådet
Horizon 2020 Framework Programme
Engineering and Physical Sciences Research Council
Fundação para a Ciência e a Tecnologia
HORIZON EUROPE Marie Sklodowska-Curie Actions

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article

Achieving High ON State Current through Ferroelectric Polarization‐Dependent Interfacial Resistance Switching in Undoped Orthorhombic HfO2 Films

Bipin Rajendran, Bernardo Mattos Almeida, Babak Bakhit, Luis Silvino A. Marques et al.

Dec 19, 2025

Apollo (University of Cambridge)

Ferroelectric and Negative Capacitance Devices

article

Achieving High ON State Current through Ferroelectric Polarization‐Dependent Interfacial Resistance Switching in Undoped Orthorhombic HfO2 Films

Bipin Rajendran, Bernardo Mattos Almeida, Babak Bakhit, Luis Silvino A. Marques, Marian Cosmin Istrate, Nives Strkalj, Markus Hellenbrand, Abin Varghese, Ji Soo Kim, Nuno Estrócio, Corneliu Ghica, Judith L. MacManus‐Driscoll, José P.B. Silva, Tiago Rebelo

December 19, 2025article en

Abstract

No abstract available for this paper.

Apollo (University of Cambridge)

Royal Academy of Engineering, Forschungszentrum Jülich, Vetenskapsrådet, Horizon 2020 Framework Programme, Engineering and Physical Sciences Research Council, Fundação para a Ciência e a Tecnologia, HORIZON EUROPE Marie Sklodowska-Curie Actions

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Ferroelectric and Negative Capacitance Devices

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