Long-wave infrared narrowband multispectral filter based on the plasma decoupling mechanism

Metal plasmonic filters enable compact multispectral sensing, yet conventional designs are constrained by Ohmic losses. In this work, we designed and fabricated a narrowband long-wave infrared spectral filter based on perforated Au films and nanorings, achieving high-resolution multispectral filtering in the 7.5–14 μm range with a FWHM of only 0.26 μm, approximately one-fifth that of conventional plasmonic filters. Fabrication was accomplished using i-line stepper lithography for large-area patterning, while the self-deposition effect during ion-beam etching was ingeniously leveraged to achieve cost-effective nanoring fabrication. The transmission bandwidth of the fabricated filter was characterized using Fourier-transform infrared spectroscopy, demonstrating excellent agreement between experimental and simulation results. This work holds promise for addressing the long-standing resolution limitations of plasmonic filters.

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Publication Details

Journal
Applied Physics Letters
Published
2026-03-02
DOI
https://doi.org/10.1063/5.0320931
Primary Topic
Plasmonic and Surface Plasmon Research
Type
article
Field-Weighted Citation Impact
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article

Long-wave infrared narrowband multispectral filter based on the plasma decoupling mechanism

Mingce Chen, Yanbo Wang, Keyan Cao and Jie Dong, Yansong Song et al.
Applied Physics Letters
Plasmonic and Surface Plasmon Research
article

Long-wave infrared narrowband multispectral filter based on the plasma decoupling mechanism

Mingce Chen, Yanbo Wang, Keyan Cao and Jie Dong, Yansong Song, Weibo Duan, Gong Zhang
article en

Abstract

Metal plasmonic filters enable compact multispectral sensing, yet conventional designs are constrained by Ohmic losses. In this work, we designed and fabricated a narrowband long-wave infrared spectral filter based on perforated Au films and nanorings, achieving high-resolution multispectral filtering in the 7.5–14 μm range with a FWHM of only 0.26 μm, approximately one-fifth that of conventional plasmonic filters. Fabrication was accomplished using i-line stepper lithography for large-area patterning, while the self-deposition effect during ion-beam etching was ingeniously leveraged to achieve cost-effective nanoring fabrication. The transmission bandwidth of the fabricated filter was characterized using Fourier-transform infrared spectroscopy, demonstrating excellent agreement between experimental and simulation results. This work holds promise for addressing the long-standing resolution limitations of plasmonic filters.

Applied Physics LettersVol. 128(9)
Changchun University of Science and Technology (CN), Shanghai University of Engineering Science (CN), China Academy of Space Technology (CN)
Openalex Percentile: Top 36%
Plasmonic and Surface Plasmon Research
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