Vacancy-Driven Electronic Effects in Few-Layer HfS <sub>2</sub> Probed by Scanning Tunneling Microscopy and Spectroscopy

Vacancy-driven electronic effects in bulk and few-layer hafnium disulfide (HfS2) were investigated using scanning tunneling microscopy/spectroscopy and density functional theory simulations. Fermi level variations associated with sulfur vacancies were observed in spectroscopic data carried out on both bulk and nanoflakes of HfS2. Atomically resolved imaging revealed structural sulfur vacancies, which locally induce a pronounced shift in the Fermi level. Stoichiometric regions exhibit p-type semiconducting behavior, whereas defective regions display clear n-type doping. A noticeable reduction in the average band gap was also observed near sulfur vacancies, decreasing from 1.28 to 1.19 eV in bulk material. Finally, a thickness-dependent evolution of the electronic band gap was observed, ranging from 1.48 eV for the 3-layer to 1.28 eV for bulk HfS2.

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Publication Details

Journal
The Journal of Physical Chemistry C
Published
2026-03-03
DOI
https://doi.org/10.1021/acs.jpcc.5c08105
Primary Topic
Semiconductor materials and interfaces
Type
article
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article

Vacancy-Driven Electronic Effects in Few-Layer HfS 2 Probed by Scanning Tunneling Microscopy and Spectroscopy

Rafael R. Barreto, Bruna F. Baggio, R. Magalhães‐Paniago, Gustavo H. R. Soares et al.
The Journal of Physical Chemistry C
Semiconductor materials and interfaces
article

Vacancy-Driven Electronic Effects in Few-Layer HfS 2 Probed by Scanning Tunneling Microscopy and Spectroscopy

Rafael R. Barreto, Bruna F. Baggio, R. Magalhães‐Paniago, Gustavo H. R. Soares, Lucas Polesi, Ananery Lopes Ribeiro, Guilherme Rodrigues-Fontenele, Gabriel Fontenele, Angelo Malachias
article en

Abstract

Vacancy-driven electronic effects in bulk and few-layer hafnium disulfide (HfS2) were investigated using scanning tunneling microscopy/spectroscopy and density functional theory simulations. Fermi level variations associated with sulfur vacancies were observed in spectroscopic data carried out on both bulk and nanoflakes of HfS2. Atomically resolved imaging revealed structural sulfur vacancies, which locally induce a pronounced shift in the Fermi level. Stoichiometric regions exhibit p-type semiconducting behavior, whereas defective regions display clear n-type doping. A noticeable reduction in the average band gap was also observed near sulfur vacancies, decreasing from 1.28 to 1.19 eV in bulk material. Finally, a thickness-dependent evolution of the electronic band gap was observed, ranging from 1.48 eV for the 3-layer to 1.28 eV for bulk HfS2.

The Journal of Physical Chemistry CVol. 130(11)
Universidade Federal de Minas Gerais (BR), Universidade Estadual de Campinas (UNICAMP) (BR), Brazilian Center for Research in Energy and Materials (BR), Laboratório Nacional de Nanotecnologia
Openalex Percentile: Top 36%
Semiconductor materials and interfaces
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Vacancy-Driven Electronic Effects in Few-Layer HfS <sub>2</sub> Probed by Scanning Tunneling Microscopy and Spectroscopy — Rafael R. Barreto, Bruna F. Baggio, et al. · The Journal of Physical Chemistry C (2026) | TGRS Research Map | TGRS